Complete Equipment Catalog for Semiconductor Wafer Manufacturing

12-inch MCZ crystal puller
  • Technology: Continuous CZ (CCz) / H-MCZ
  • Max Diameter: 300 mm / 12 inch
  • Chamber ID: Φ1400 mm
  • Diameter Control: ±0.05 mm
Kyropoulos Sapphire Crystal Growth Furnace
  • Method: Continuous Czochralski (CCz) / H-MCZ
  • Max Capacity: 1000kg (Customizable)
  • Max Diameter: 300 mm / 12 inch
  • Uniformity: < 6.0% Resistivity (RRG)
Continuous Czochralski Crystal Puller
  • Method: Continuous Czochralski (CCz) / H-MCZ
  • Max Capacity: 1000kg (Customizable)
  • Max Diameter: 300 mm / 12 inch
  • Uniformity: < 6.0% Resistivity (RRG)
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