Ge Growth Furnace

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Crystal Growth and Wafer Manufacturing Equipment by Process Stage

Germanium crystal growth furnaces are configured to order. Contact us with your ingot diameter and target output for a matching configuration.

Germanium Crystal Growth Furnace KX240Ge

  • Method: Czochralski (CZ)
  • Max Diameter: 12 inch
  • Charge Capacity: 450 kg
  • Temperature Control: ±0.5 °C
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Continuous Czochralski Crystal Puller

Silicon Crystal Puller

  • Method: Continuous Czochralski (CCz) / H-MCZ
  • Max Capacity: 1000kg (Customizable)
  • Max Diameter: up to 10 inch
  • Uniformity: < 6.0% Resistivity (RRG)
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